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Center for Nano-MicroManufacturing
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Center for Nano-MicroManufacturing

Providing researchers with micro-nanofabrication technologies, processes, and services
  • UC Davis

Main navigation (extended config)

  • About Us
    • CNM2 Team Contact Info
      • Brianna Portillo
    • Location and Parking Information
    • CNM2 User Publications
    • Facility Tours
    • Cleanroom Video Tour
    • UC Davis Holidays
  • Getting Started
    • Internal UC Access Procedure
    • External Non UC Access Procedure
    • Facility Usage Rates Effective July 1, 2024
    • Microfabrication Services
    • Badger Lab Management Software
  • Safety
    • SDS/SOP Table
    • CNM2 Policies and Procedures
    • Chemical Directory
    • Request approval of non-stock chemical
    • Cleanroom Map
    • UC Davis Chemical Hygiene Plan
  • Equipment
    • Lithography
      • GCA 8500 i-line Stepper
      • EVG 620-mask aligner
      • Heidelburg uPG101 Laser Lithography System
      • Karl Suss MA4 1 & 2
      • Brewer Photoresist Spinners 1 & 2
      • NPGS Electron Beam Lithography
      • Laurell Photoresist Spinner
      • Sky 335R6 Heated-Roller Laminator
    • Etch
      • PlasmaTherm Apex SLR RIE/ICP
      • PlasmaTherm Apex SLR RIE
      • PlasmaTherm Versaline DSE
      • PlasmaTherm Vision 320 RIE
      • IntlVac Nanoquest IBE/RIBE/CAIBE
      • Xactix XeF2 Etcher
      • PETS RIE
      • Yield Engineering Systems G500 O2 Plasma Etcher
    • Thin Film Deposition
      • IntlVac Nanochrome I Ebeam/Thermal Evaporator
      • CHA E-beam Evaporator
      • Lesker Labline Sputter System
      • Picosun R-200 PEALD
      • PlasmaTherm Versaline HDPCVD
      • PlasmaTherm Vision 310 PECVD
      • Quorum Tech Gold/Carbon Sputter Coater
    • Metrology
      • J.A. Woollam M-2000 Ellipsometer
      • Bruker Dektak XT
      • Nanometrics Nanospec
      • 4 point probe
      • HP 4155A and Probe Station
    • Microscopy and Micro Analysis
      • FEI Scios Dualbeam FIB/SEM
      • FEI Nova NanoSEM 430
      • Nikon TMS Infrared Microscope
      • Carl Zeiss Axiotron Microscope
    • Cleaning and Preparation
      • Nitrogen Glove Box
      • Novascan UV Ozone Cleaner
      • Semitool Spin Rinser
      • Ultra T SCSx124 Substrate Cleaning System
    • Packaging
      • EVG 501 Wafer Bonder
      • EVG 810 Plasma Activation
      • Disco DAD 321 Dicing Saw
      • Tousimis AutoSamdri 815 Critical Point Dryer
      • Nordson DAGE 4000 Bond Tester System
      • West Bond 7700E Wire Bonder
    • Thermal Processing
      • Allwin AW610 Rapid Thermal Processor
      • Annealsys As-One RTP
      • Programmable Oven
  • Training
    • Photolithography Workshops
    • Access to CNM2 Equipment
    • Equipment Basic Training
    • Equipment Specialized Training
    • General Training and Short Courses
    • Training Charges Explained
  • Process
    • Photoresists Provided
    • Photolithography and EBL Baseline Recipes
    • Process Monitors
    • Materials Provided
    • General Chemicals Provided
    • Process Notes
  • Contact Us
    • CNM2 Team Contact Info
  • AMCaT
  • Badger web link
Breadcrumb
  1. Center for Nano-MicroManufacturing
  2. Equipment
  3. Microscopy and Micro Analysis
Equipment Location Contact
Carl Zeiss Axiotron Microscope 1224A6 Ryan Anderson
FEI Nova NanoSEM 430 1249 Ryan Anderson
FEI Scios Dual Beam FIB/SEM 1249 Ryan Anderson
Nikon TMS Infrared Microscope 1274 Dr. Vishal Narang
Oxford EDS and EBSD 1249 Ryan Anderson
Badger
Chemical SOPs
Contact Us
CNM2 Policies and Procedures
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  • Last update: May 2, 2025

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Center for Nano MicroManufacturing   |   1209 Kemper Hall   |   530-752-9831

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