Location
1224A1
Contact
The patented hot-wall design with fully separate inlets and instrumentation enables particle-free processing adaptable on a wide range of materials on wafers, 3D objects, and all nanoscale features. Excellent uniformity even on the most challenging through-porous, ultra-high aspect ratio, and nanoparticle samples is achieved.
Available Films:
- Aluminum Oxide
- Aluminum Nitride
- Zinc Oxide
- Zinc Nitride
- Silicon Dioxide, Silicon Nitride
- Hafnium Oxide
- Hafnium Nitride
- Gallium Oxide
- Gallium Nitride