Picosun R-200 Plasma Enhanced ALD

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The patented hot-wall design with fully separate inlets and instrumentation enables particle-free processing adaptable on a wide range of materials on wafers, 3D objects, and all nanoscale features. Excellent uniformity even on the most challenging through-porous, ultra-high aspect ratio, and nanoparticle samples is achieved.  

Available Films:

  • Aluminum Oxide
  • Aluminum Nitride
  • Zinc Oxide
  • Zinc Nitride
  • Silicon Dioxide, Silicon Nitride
  • Hafnium Oxide
  • Hafnium Nitride
  • Gallium Oxide
  • Gallium Nitride