![RIE](/sites/g/files/dgvnsk5151/files/styles/equipment/public/2019-03/Apex%20SLR%20RIE.jpg?itok=ZiuDW4Dy)
Location
1224B2
Contact
Advanced Vacuum’s APEX SLR provides etching capabilities over a variety of materials and substrates. This system utilizes Cl2, BCl3, Ar and O2 process gasses to accommodate a large variety of dry etch process capabilities. Historically the tool has been used to etch III-V materials, and various oxides. System can accommodate sample sizes ranging from full 6" wafers to odd size parts and pieces. Samples other than 6" wafers are mounted on a 6" carrier wafer.
Metal etches and material compatibility need to be discussed with staff. Exposed Gold and other potential sources of mobile ion contamination are not allowed in the chamber.