Location
1224B3
Contact
Plasma-Therm’s VERSALINE HDPCVD product is a new approach to achieving highly dense and conformal films at low substrate temperatures. The system utilizes a high-density ICP plasma with a temperature-controlled and biased substrate. Uniform gas injection at the substrate level maximizes film quality. This system utilizes SiH4, N2, O2, CH4 and Ar process gasses to grow a large variety of films including:
- Silicon dioxide
- Silicon nitride,
- Silicon carbide
- Silicon oxy-nitride
- Amorphous silicon
Quiz