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An excellent state-of-the-art SEM, the FEI Nova NanoSEM430 creates publication quality images on a wide variety of materials. A high level of beam control allows users to optimize the conditions to fit their needs: from .3-30kV, and 15-1500pA. The microscope has an immersion mode, which allows resolution down to 2nm. The onboard software allows for image post-processing such as size-bars, gamma and false color.
In addition to microscopy, the FEI SEM can also aid in fabrication. It can write in an EBL resist or directly deposit Platinum with feature sizes as small as ~25nm using its NPGS retrofit.