The Vision 320 is a manual load, parallel plate reactive ion etcher (RIE) configured for fluorine based etching. Etch gases connected to the system are CF4, CHF3, SF6, Ar and O2. Common materials etched in fluorine chemistries include silicon oxide (SiO2), silicon nitride (Si3N4) isotropic etching of silicon and fluorine etchable metals. The platen is a 10” graphite plate capable of holding sample pieces up to a 10” substrate.
PlasmaTherm Vision 320 RIE