The Model SCSx124 Substrate Cleaning System is designed for submicron cleaning of photomasks, wafers and substrates and utilizes an assortment of cleaning technologies. The SCSx124 is configured with several different cleaning options including atomizing mist nozzle, brushes, megasonic nozzles and high pressure DI water. The Rapid and Effective drying technique combines variable spin speeds, heated DI water and nitrogen assist to rapidly dry the substrate. Microprocessor controller is capable of retaining thirty recipes in memory, each with up to thirty steps.
Ultra T SCSx124 Substrate Cleaning System