![EVG aligner](/sites/g/files/dgvnsk5151/files/styles/equipment/public/2019-02/44626473065_36476aac61_k.jpg?itok=8y7eWNUC)
Location
1274
Contact
- EVG620 Double side mask alignment system is designed for optical - double side lithography
- PC controlled operating environment
- EVG620 can be used for the following alignment processes:
- Top side alignment
- Bottom side alignment
- Large gap alignment
- Bond alignment
Training Video