| Brewer Photoresist Spinners 1 & 2 |
1224A8 |
Siwei Li |
| CEE 100 Spinner |
1224B4 |
Siwei Li |
| NPGS Electron Beam Lithography |
1249 |
Ryan Anderson |
| Solitec Photoresist Spinner 1 & 2 |
1224A7 |
Siwei Li |
| EVG 620-mask aligner |
1274 |
Siwei Li |
| GCA 8500 i-line Stepper |
1242 |
Siwei Li |
| Karl Suss MA4-1 and MA4-2 |
1224A8 |
Siwei Li |
