NPGS Electron Beam Lithography

FEI SEM
Location
1249
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The FEI Nova NanoSEM430 creates publication quality images on a wide variety of materials. A high level of beam control allows users to optimize the conditions to fit their needs: from .3-30kV, and 15-1500pA. The microscope is configured with an immersion lens and Through Lens Detector, which allows imaging resolution of 2nm. The onboard software allows for image post-processing such as size-bars, gamma and false color.

Nabity Pattern Generation System (NPGS)

In addition to imaging, the FEI Nova NanoSEM 430 can be used for direct write electron beam lithography.  Users can expose electron sensitive resist or use the platinum gas injection system to generate nanoscale patterns on the surface of the sample.