Xactix_XeF2_Etch

Xenon Difluoride Etcher (XeF2)Xenon Difluoride EtcherManufacturer: SPTSModel : XactiX e1 Release Etch SystemRATES | Operation Manual 

 Isotropic etching of silicon using xenon difluoride is an ideal solution for releasing MEMS devices. XeF2 shows high selectivity to silicon over almost all standard semiconductor materials including photoresist, silicon dioxide, silicon nitride and aluminum. Being a vapor phase etchant, XeF2 avoids many of the problems typically associated with wet or plasma etch processes.