The system has two MFC controlled gas channels capable of annealing substrates in N2, O2, or forming gas (H2:Ar) ambient. The system is a cold wall, quartz chamber, which is heated with top and bottom arrays of high intensity halogen lamps using a closed-loop temperature control using either a pyrometer (550C to 1150C) or a thermocouple (100C to 700C). The anneal chamber consists of a quartz tray compatible with pieces (on a Si carrier wafer), 4â and 6â wafers.
Rapid Thermal Processor
Allwin21 AW610 Rapid Thermal Processor Model: AccuThermoManufacturer: Allwin 21RATES | Operation Manual