The Vision 310 PECVD is a fundamental deposition system for semiconductor fabrication and material science facilities. Used in R&D and low volume production applications, the classic parallel plate configuration provides a wide range of high quality, uniform films. Simple installation and operation, reliable hardware and software suite, coupled with a small footprint, make the Vision 310 PECVD the most cost effective turnkey solution in its class. This system utilizes SiH4, HH3, N2 and N2O process gasses to accommodate a large variety of PECVD process capabilities. This system will be online late summer/fall 2018.