Oxford Plasmalab ICP RIE

Oxford ICP-RIEModel: Plasmalab System 100

Manufacturer: Oxford

Loacation: 1224B3

RATES | OPERATION MANUAL

Great for deep etches, the Oxford Plasmalab ICP RIE has a 13.56 MHz driven parallel plate reactor, cooled substrate electrodes, and a shower head gas inlet optimised for RIE. This system also provides a high conductance vacuum layout and multiple etch modes (RIE/ICP).