The AS-One is a high temperature Rapid Thermal Process (RTP) system. It is capable of anneals as high as 1500C with a ramp rate up to 200C and cooling rates up to 100C for 4â silicon substrates. The system is pyrometer controlled and calibrated to either a bare Si wafer or a specific susceptor type. The system uses turbo pumping to achieve pump down pressures as low as 10E-6 Torr. The system has MFC controlled gas channels for annealing in controlled ambient (Ar, O2, N2, 3%H2:N2 and vacuum). The process chamber is a cold wall, stainless steel chamber. The clam shell style design and the 4â wafer process chamber provides full access to the bedplate and easy loading and unloading of the substrates.
Annealsys As-One RTPModel: As-OneManufacturer: Annealsys RATES | Operation Manual