The Nanonex provides an ideal option for small-volume, convenient Nanoimprint Lithography (NIL). Capable of reaching temperatures up to 300 Â°C, and pressures up to 500 psi, this machineÂ provides an intuitive user interface to customize NIL recipes. It is equipped with a UV lamp for photocurable NIL resists, and pulls a vacuum in the chamber before each run to reduce oxygen contamination of acrylate based NIL resists. The Nanonex is compatible with both hard (Quartz, Ni) and soft (PDMS) stamps. Together with the cleanroomâs dipcoater, the Nanonex can perform embossing as well as NIL.