The MRL furnaces consist of three separate chambers designed to oxidize MOS clean Silicon, oxidize MEMS clean Silicon and anneal various metals. It can run both wet and dry oxidations at temperatures up to 1200C, allowing for a wide variety of speeds and quality processes. The anneal furnace is plumbed with syngas for annealing in a reductive atmosphere. Though not often used, the tool is also able to dope wafers. Alternatives for high temperature processing include the Rapid Thermal Processor.
Model:Manufacturer: MRL IndustriesLocation: 1224A1RATESÂ | Opertation Manual