The Advanced Vacuum Vision 320 is a manual load, parallel plate reactive ion etcher (RIE) configured for fluorine based etching. Etch gases connected to the system are CF4, CHF3, SF6, Ar and O2. Common materials etched in fluorine chemistries include silicon oxide (SiO2), silicon nitride (Si3N4) isotropic etching of silicon and fluorine etchable metals. The platen is a 10â graphite plate capable of holding sample pieces up to a 10â substrate.
Advance Vacuum Fluorine RIEManufacturer: Advance Vacuum Model : Vision 320RATES | Operation Manual