Model: EasyTube 3000
RATESÂ | Operation Manual
This first generation FirstNano CVD tool deposits thin films of Silicon and Germanium, as well as nanowires with high aspect ratios. It has the ability to deposit both doped and undoped materials. This machine is equipped with SiH4 (100 %) , B2H6 (100 ppm), PH3 (100 ppm), and GeH4 ( 2% in H2) operating at temperatures ranging fromÂ 100 - 1000 â. The chamber has cold walls and maintains a low pressure when depositing on 4" wafers.
An alternative for this tool is the Technics PECVD.