FEI E-Beam Lithography

Model: 430 NanoSEM

Manufacturer: FEI

Location: 1249

RATES | Operation Manual

An excellent state-of-the-art SEM, the FEI Nova NanoSEM430 creates publication quality images on a wide variety of materials. A high level of beam control allows users to optimize the conditions to fit their needs: from .3-30kV, and 15-1500pA. The microscope has an immersion mode, which allows resolution down to 2nm. The onboard software allows for image post-processing such as size-bars, gamma and false color.

In addition to microscopy, the FEI SEM can also aid in fabrication. It can write in an EBL resist or directly deposit Platinum with feature sizes as small as ~25nm using its NPGS retrofit.

Adjacent to the FEI is the small Hummer Sputterer for coating samples with metal thin films to enhance contrast.