CEE 100 Spinner

CEE 100 Spinner
Location
1224B4
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Ideal for thick photoresist deposition, the Brewer Spinner features a fully enclosed vacuum chuck for use with 4” wafers. It offers digital control of ramp rates and multi-step spin processes. It’s adjacent to an 8” Solitec hotplate and a larger precisely-leveled hotplate for use with millimeter-thick lithography.