Ideal for cleaning delicate MEMS devices, the Tousimis Critical Point Dryer is set up with bone dry liquid CO2 at high pressure to clean off any liquid etchants or strippers, without destroying delicate features through surface tension. It will only support chips roughly 1 inch or smaller. An alternative for MEMS release and avoiding surface tension is the HF Vapor Etch Tool.
Critical Point Dryer
Tousimis Critical Point DryerModel: Autosamdri-815Manufacturer: TousimisLocation: 1224A6RATES | Operation Manual