CHA Thermal Evaporator

Thermal Evaporator 2Model: CHA-600

Manufacturer: CHA Industries

Location: 1224B1

RATES | Operation Manual

Using resistive heat to evaporate metals into thin films, the CHA Thermal Evaporator can deposit up to 1500 nm thick films of aluminum only. It operates at powers around 3500W with pressures around 10-8 Torr and can hold up to eighteen wafers per run.

Alternatives to the thermal evaporator include the CHA E-Beam Evaporator, the CHA Sputterer or the Lesker Sputterer.